New Delhi, September 17: Japanese technology major Fujifilm plans to invest around ₹800 crore to set up a greenfield semiconductor materials manufacturing facility in India, with commercial production targeted in fiscal year 2028.
The planned investment, equivalent to about $83 million, will be undertaken in two phases beginning in October 2026, with the expansion linked to the development of India’s semiconductor industry and customer demand.
Under the first phase, Fujifilm will establish manufacturing capabilities to support front-end process chemicals used in semiconductor production.
The second phase will cover semiconductor surface conditioning materials and high-purity chemicals. Investment under this phase will be undertaken in line with the actual development of India’s semiconductor industry in the coming years.
Fujifilm said it intends to work closely with the India Semiconductor Mission and seek to utilise government support available under the next phase of India’s semiconductor programme.
The company said it aims to provide semiconductor material solutions covering almost all stages of semiconductor manufacturing, ranging from advanced processes to legacy nodes.
Fujifilm already operates a global semiconductor materials manufacturing network across Japan, the United States, Europe and Asia.
The proposed India facility will mark a further expansion of the company’s semiconductor materials manufacturing footprint as the country builds domestic capacity across different segments of the chip manufacturing ecosystem.
